Our alumina sputtering targets are suited to a variety of applications including wear coatings, dielectric coatings and barrier coatings, whereas our CVD SiC?sputtering targets are an excellent choice for?the deposition of high-purity SiC thin films for demanding applications such?as the manufacture of magnetic disk drive heads.

Features of our sputtering targets:

• Controlled microstructures
• Very high purity, consistency, and uniformity
• Thermal conductivity that is twice that of sintered SiC
• Highly resistant to thermal shock

Benefits of our sputtering targets include:

• Sizes to one meter
• High tolerance ceramic machining/polishing
• Near net shape processing

Our Technical Ceramics engineers work closely with our customers to design products to exact requirements, from design through to end production. ?

For more information on our ceramic sputtering targets contact us today.