Sputtering Targets

The Technical Ceramics business of Morgan Advanced Materials are specialists in the manufacture of ceramic sputtering targets for the Semiconductor Industry manufactured from 94%-99.99% alumina and Chemical Vapor Deposition (CVD) Silicon Carbide (SiC) for Physical Vapour Deposition (PVD) applications.

Our alumina sputtering targets are suited to a variety of applications including wear coatings, dielectric coatings and barrier coatings, whereas our CVD SiC?sputtering targets are an excellent choice for?the deposition of high-purity SiC thin films for demanding applications such?as the manufacture of magnetic disk drive heads.

Features of our sputtering targets:

  • Controlled microstructures
  • Very high purity, consistency, and uniformity
  • Thermal conductivity that is twice that of sintered SiC
  • Highly resistant to thermal shock

Benefits of our sputtering targets include:

  • Sizes to one meter
  • High tolerance ceramic machining/polishing
  • Near net shape processing

Our Technical Ceramics engineers work closely with our customers to design products to exact requirements, from design through to end production. ?

For more information on our ceramic sputtering targets contact us today.